Characterisation of Ni–Ti thin films produced by filtered arc deposition

Stanford, N., Huang, S. and Dunne, D. 2008, Characterisation of Ni–Ti thin films produced by filtered arc deposition, Materials science and engineering A: structural materials: properties, microstructures and processing, vol. 473, no. 1-2, pp. 172-179.

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Title Characterisation of Ni–Ti thin films produced by filtered arc deposition
Author(s) Stanford, N.
Huang, S.
Dunne, D.
Journal name Materials science and engineering A: structural materials: properties, microstructures and processing
Volume number 473
Issue number 1-2
Start page 172
End page 179
Total pages 8
Publisher Elsevier SA
Place of publication Lausanne, Switzerland
Publication date 2008-01-25
ISSN 0921-5093
1873-4936
Keyword(s) shape memory
thin film
filtered arc deposition
Summary Ti–49.5 at%Ni thin films have been formed by deposition onto Si and glass substrates using a filtered arc deposition system (FADS). The films deposited on glass were composed of nanocrystalline parent phase grains contained within an amorphous matrix. The films deposited onto silicon were crystalline, and were largely parent phase whereas a bulk alloy of the same composition would be expected to be martensite. The stabilisation of the parent phase is proposed to be a grain size effect, with the critical grain size for parent phase stabilisation being about 30 nm.
Language eng
Field of Research 091207 Metals and Alloy Materials
Socio Economic Objective 970109 Expanding Knowledge in Engineering
HERDC Research category C1 Refereed article in a scholarly journal
Copyright notice ©2007, Elsevier B.V.
Persistent URL http://hdl.handle.net/10536/DRO/DU:30017308

Document type: Journal Article
Collections: Centre for Material and Fibre Innovation
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