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Chemical vapor deposition for film deposition

Dharmalingam, Sugumar and Kong, Lingxue 2008, Chemical vapor deposition for film deposition. In Li, Dongqing (ed), Encyclopedia of microfluidics and nanofluidics, Springer, New York, N. Y., pp.255-260, doi: 10.1007/978-0-387-48998-8_214.

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Title Chemical vapor deposition for film deposition
Author(s) Dharmalingam, Sugumar
Kong, LingxueORCID iD for Kong, Lingxue
Title of book Encyclopedia of microfluidics and nanofluidics
Editor(s) Li, Dongqing
Publication date 2008
Series Springer reference
Start page 255
End page 260
Total pages 3 v.
Publisher Springer
Place of Publication New York, N. Y.
ISBN 0387490000
Language eng
DOI 10.1007/978-0-387-48998-8_214
Field of Research 091306 Microelectromechanical Systems (MEMS)
Socio Economic Objective 861603 Integrated Circuits and Devices
HERDC Research category D2 Reference work
Persistent URL

Document type: Book Chapter
Collection: Centre for Material and Fibre Innovation
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