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Laser-induced site-selective silver seeding on polyimide for electroless copper plating

Chen, Dongsheng, Lu, Qinghua and Zhao, Yan 2006, Laser-induced site-selective silver seeding on polyimide for electroless copper plating, Applied surface science, vol. 253, no. 3, pp. 1573-1580, doi: 10.1016/j.apsusc.2006.02.039.

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Title Laser-induced site-selective silver seeding on polyimide for electroless copper plating
Author(s) Chen, Dongsheng
Lu, Qinghua
Zhao, Yan
Journal name Applied surface science
Volume number 253
Issue number 3
Start page 1573
End page 1580
Total pages 8
Publisher Elsevier
Place of publication Amsterdam, Netherlands
Publication date 2006-11
ISSN 0169-4332
1873-5584
Summary Ag particles were generated on Ag+-doped polyimide film by laser direct writing, followed by selective copper deposition using the metallic silver particles as seeds. Laser irradiation caused in situ reduction and agglomeration of silver on the polyimide film. The copper lines were less uniform and compact with higher scanning velocity and the width of the deposited copper line could reach 25 mu m. Equations of the relationship between scanning velocity and connectivity of the deposited copper patterns have been derived. The process was characterised by AFM, XPS, SEM, and semiconductor characterisation system.
Language eng
DOI 10.1016/j.apsusc.2006.02.039
Field of Research 091299 Materials Engineering not elsewhere classified
HERDC Research category C1.1 Refereed article in a scholarly journal
Copyright notice ©2006, Elsevier
Persistent URL http://hdl.handle.net/10536/DRO/DU:30025863

Document type: Journal Article
Collection: Centre for Material and Fibre Innovation
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