Photolithography area dispatching scheme for semiconductor wafer fabrication facility

Lung, D., Kong L X. and Hsu, H.Y. 2003, Photolithography area dispatching scheme for semiconductor wafer fabrication facility, in ICME 2003 : Conference proceedings International Conference on Manufacturing Engineering, Association for Manufacturing Excellence, [Melbourne, Vic].


Title Photolithography area dispatching scheme for semiconductor wafer fabrication facility
Author(s) Lung, D.
Kong L X.
Hsu, H.Y.
Conference name International Conference on Manufacturing Engineering (9th : 2003 : Melbourne, Australia)
Conference location Melbourne, Vic.
Conference dates 13-15 October 2003
Title of proceedings ICME 2003 : Conference proceedings International Conference on Manufacturing Engineering
Editor(s) Brown, R. H.
Publication date 2003
Publisher Association for Manufacturing Excellence
Place of publication [Melbourne, Vic]
ISBN 9781877040177
1877040177
Language eng
Field of Research 091006 Manufacturing Processes and Technologies (excl Textiles)
HERDC Research category E1.1 Full written paper - refereed
Persistent URL http://hdl.handle.net/10536/DRO/DU:30026045

Document type: Conference Paper
Collection: Centre for Material and Fibre Innovation
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