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Die temperature monitoring of high pressure die casting

Kong, L.X., She, F.H., Nahavandi, S. and Kouzani, A.Z. 2000, Die temperature monitoring of high pressure die casting, in SMC 2000 : Cybernetics evolving to systems, humans, organizations, and their complex interactions : Proceedings of the IEEE Systems, Man & Cybernetics 2000 international conference, IEEE, Piscataway, N.J., pp. 1756-1761, doi: 10.1109/ICSMC.2000.886363.

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Title Die temperature monitoring of high pressure die casting
Author(s) Kong, L.X.ORCID iD for Kong, L.X. orcid.org/0000-0001-6219-3897
She, F.H.ORCID iD for She, F.H. orcid.org/0000-0001-8191-0820
Nahavandi, S.ORCID iD for Nahavandi, S. orcid.org/0000-0002-0360-5270
Kouzani, A.Z.ORCID iD for Kouzani, A.Z. orcid.org/0000-0002-6292-1214
Conference name IEEE Systems, Man, and Cybernetics. International Conference (2000 : Nashville, Tenn.)
Conference location Nashville, Tenn.
Conference dates 8-11 Oct. 2000
Title of proceedings SMC 2000 : Cybernetics evolving to systems, humans, organizations, and their complex interactions : Proceedings of the IEEE Systems, Man & Cybernetics 2000 international conference
Editor(s) [Unknown]
Publication date 2000
Conference series IEEE Systems, Man, and Cybernetics International Conference
Start page 1756
End page 1761
Total pages 6
Publisher IEEE
Place of publication Piscataway, N.J.
ISBN 0780365844
9780780365841
ISSN 1062-922X
Language eng
DOI 10.1109/ICSMC.2000.886363
Field of Research 080106 Image Processing
Socio Economic Objective 970110 Expanding Knowledge in Technology
HERDC Research category E2.1 Full written paper - non-refereed / Abstract reviewed
Copyright notice ©2000, IEEE
Free to Read? Yes
Persistent URL http://hdl.handle.net/10536/DRO/DU:30026091

Document type: Conference Paper
Collections: School of Engineering and Technology
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Every reasonable effort has been made to ensure that permission has been obtained for items included in DRO. If you believe that your rights have been infringed by this repository, please contact drosupport@deakin.edu.au.