Combined continuous wave and pulsed plasma modes : For more stable interfaces with higher functionality on metal and semiconductor surfaces

Combined continuous wave and pulsed plasma modes : For more stable interfaces with higher functionality on metal and semiconductor surfaces

Li, Li, Dai, Xiujuan J., Xu, Hong S., Zhao, Jing H., Yang, Ping, Maurdev, George, du Plessis, Johan, Lamb, Peter R., Fox, Bronwyn and Michalski, Wojtek 2009, Combined continuous wave and pulsed plasma modes : For more stable interfaces with higher functionality on metal and semiconductor surfaces, Plasma processes and polymers, vol. 6, no. 10, pp. 615-619.

Attached Files (Some files may be inaccessible until you login with your Deakin Research Online credentials)
Name			Description	MIMEType		Size	Downloads

Title	Combined continuous wave and pulsed plasma modes : For more stable interfaces with higher functionality on metal and semiconductor surfaces
Author(s)	Li, Li Dai, Xiujuan J. Xu, Hong S. Zhao, Jing H. Yang, Ping Maurdev, George du Plessis, Johan Lamb, Peter R. Fox, Bronwyn Michalski, Wojtek
Journal name	Plasma processes and polymers
Volume number	6
Issue number	10
Start page	615
End page	619
Publisher	Wiley – VCH Verlag GmbH & Co. KGaA
Place of publication	Weinheim, Germany
Publication date	2009-10-14
ISSN	1612-8850 1612-8869
Keyword(s)	adhesion bio-interfaces continuous wave (CW) pulsed plasma polymerization (PP) molecular bonding aqueous solutions
Summary	A novel approach to producing improved bio-interfaces by combining continuous wave (CW) and pulsed plasma polymerization (PP) modes is reported. This approach has enabled the generation of stable interfaces with a higher density of primary amine functionality on metal, ceramic and semiconductor surfaces. Heptylamine (HA) was used as the amine-precursor. In this new design, a thin CW PPHA layer is introduced to provide strong cross-linking and attachment to the metal or semiconductor surfaces and to provide a good foundation for better bonding a pulsed PPHA layer with high retention of functional groups. The combined mode provides the pulsed mode advantage of a 3-fold higher density of primary amines, while retaining much of the markedly higher stability in aqueous solutions of the continuous mode.
Language	eng
Field of Research	091202 Composite and Hybrid Materials
Socio Economic Objective	970109 Expanding Knowledge in Engineering
HERDC Research category	C1 Refereed article in a scholarly journal
Copyright notice	©2009, WILEY-VCH Verlag GmbH & Co
Persistent URL	http://hdl.handle.net/10536/DRO/DU:30028420

Document type:	Journal Article
Collection:	Centre for Material and Fibre Innovation

Citation counts:	Cited 5 times in TR Web of Science Cited 6 times in Scopus
Access Statistics:	376 Abstract Views, 3 File Downloads - Detailed Statistics
Created:	Wed, 21 Apr 2010, 11:28:53 EST by Sandra Dunoon

Deakin Research Online

Combined continuous wave and pulsed plasma modes : For more stable interfaces with higher functionality on metal and semiconductor surfaces

Study

Research

Access Deakin

On campus

Connect