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Influence of N2O flow rate on reliability of SiOx films deposited by SiH4-N2O gas mixture plasma

Nam, Nguyen Dang, Kim, Jung-Gu, Kim, Duck Jin and Lee, Nae Eung 2009, Influence of N2O flow rate on reliability of SiOx films deposited by SiH4-N2O gas mixture plasma, Japanese journal of applied physics, vol. 48, no. 8, Part 2, pp. 08HJ011-08HJ014, doi: 10.1143/JJAP.48.08HJ01.

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Title Influence of N2O flow rate on reliability of SiOx films deposited by SiH4-N2O gas mixture plasma
Formatted title Influence of N2O flow rate on reliability of SiOx films deposited by SiH4-N2O gas mixture plasma
Author(s) Nam, Nguyen Dang
Kim, Jung-Gu
Kim, Duck Jin
Lee, Nae Eung
Journal name Japanese journal of applied physics
Volume number 48
Issue number 8
Season Part 2
Start page 08HJ011
End page 08HJ014
Total pages 4
Publisher Institute of Pure and Applied Physics
Place of publication Tokyo, Japan
Publication date 2009
ISSN 0021-4922
1347-4065
Keyword(s) coating performance
electronic device
fourier transform infrared
inter-layer dielectrics
potentiodynamic polarization tests
Summary SiOx films have several advantages as an interlayer dielectric in electronic devices owing to the strong adhesion between SiOx and the substrate. In this study, the coating performance as a function of the N2O flow rate was evaluated by electrochemical impedance spectroscopy and potentiodynamic polarization tests in an undisturbed environment. In addition, the coatings were examined by atomic force microscopy and Fourier transform infrared reflection spectroscopy. The SiOx films on a stainless-steel substrate showed the highest coating performance at a N2O flow rate of 120 sccm. This was attributed to the films having the lowest porosity value among those examined as a result of the fragmentation of SiO and SiO2 bonds and the improved surface roughness.
Language eng
DOI 10.1143/JJAP.48.08HJ01
Field of Research 099999 Engineering not elsewhere classified
Socio Economic Objective 970109 Expanding Knowledge in Engineering
HERDC Research category C1.1 Refereed article in a scholarly journal
Copyright notice ©2009, The Japan Society of Applied Physics
Persistent URL http://hdl.handle.net/10536/DRO/DU:30047968

Document type: Journal Article
Collection: Institute for Frontier Materials
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