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Investigation on the controllable growth of monodisperse silica colloid abrasives for the chemical mechanical polishing application

Hu, XiaoKai, Song, Zhitang, Wang, Haibo, Liu, Weili and Zhang, Zefang 2010, Investigation on the controllable growth of monodisperse silica colloid abrasives for the chemical mechanical polishing application, Microelectronic engineering, vol. 87, no. 9, pp. 1751-1755, doi: 10.1016/j.mee.2009.10.005.

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Title Investigation on the controllable growth of monodisperse silica colloid abrasives for the chemical mechanical polishing application
Author(s) Hu, XiaoKai
Song, Zhitang
Wang, Haibo
Liu, Weili
Zhang, Zefang
Journal name Microelectronic engineering
Volume number 87
Issue number 9
Start page 1751
End page 1755
Total pages 5
Publisher Elsevier
Place of publication Amsterdam, The Netherlands
Publication date 2010-11
ISSN 0167-9317
Keyword(s) silica
colloidal abrasives
CMP
growth
integrated circuit
Language eng
DOI 10.1016/j.mee.2009.10.005
Field of Research 039999 Chemical Sciences not elsewhere classified
Socio Economic Objective 970103 Expanding Knowledge in the Chemical Sciences
HERDC Research category C1.1 Refereed article in a scholarly journal
Persistent URL http://hdl.handle.net/10536/DRO/DU:30052753

Document type: Journal Article
Collection: Institute for Frontier Materials
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