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The microstructure and properties of energetically deposited carbon nitride films

Sadek,AZ, Kracica,M, Moafi,A, Lau,DWM, Partridge,JG and McCulloch,DG 2014, The microstructure and properties of energetically deposited carbon nitride films, Diamond and Related Materials, vol. 45, pp. 58-63, doi: 10.1016/j.diamond.2014.03.006.

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Title The microstructure and properties of energetically deposited carbon nitride films
Author(s) Sadek,AZ
Kracica,M
Moafi,A
Lau,DWM
Partridge,JG
McCulloch,DG
Journal name Diamond and Related Materials
Volume number 45
Start page 58
End page 63
Total pages 6
Publisher Elsevier
Place of publication Amsterdam, The Netherlands
Publication date 2014
ISSN 0925-9635
Keyword(s) Carbon nitride
Cathodic arc
Energetic deposition
N-doped carbon
Science & Technology
Technology
Materials Science, Multidisciplinary
Materials Science
CNx
ABSORPTION FINE-STRUCTURE
X-RAY SPECTROSCOPY
TA-C FILMS
AMORPHOUS-CARBON
THIN-FILMS
NEAR-EDGE
OPTICAL-PROPERTIES
ARC DEPOSITION
BEAM SOURCE
NITROGEN
Summary The intrinsic stress, film density and nitrogen content of carbon nitride (CNx) films deposited from a filtered cathodic vacuum arc were determined as a function of substrate bias, substrate temperature and nitrogen process pressure. Contour plots of the measurements show the deposition conditions required to produce the main structural forms of CNx including N-doped tetrahedral amorphous carbon (ta-C:N) and a variety of nitrogen containing graphitic carbons. The film with maximum nitrogen content (~ 30%) was deposited at room temperature with 1.0 mTorr N2 pressure and using an intermediate bias of - 400 V. Higher nitrogen pressure, higher bias and/or higher temperature promoted layering with substitutional nitrogen bonded into graphite-like sheets. As the deposition temperature exceeded 500 °C, the nitrogen content diminished regardless of nitrogen pressure, showing the meta-stability of the carbon-nitrogen bonding in the films. Hardness and ductility measurements revealed a diverse range of mechanical properties in the films, varying from hard ta-C:N (~ 50 GPa) to softer and highly ductile CN x which contained tangled graphite-like sheets. Through-film current-voltage characteristics showed that the conductance of the carbon nitride films increased with nitrogen content and substrate bias, consistent with the transition to more graphite-like films. © 2014 Elsevier B.V.
Language eng
DOI 10.1016/j.diamond.2014.03.006
Field of Research 020204 Plasma Physics; Fusion Plasmas; Electrical Discharges
020406 Surfaces and Structural Properties of Condensed Matter
029999 Physical Sciences not elsewhere classified
Socio Economic Objective 970102 Expanding Knowledge in the Physical Sciences
HERDC Research category C1 Refereed article in a scholarly journal
ERA Research output type C Journal article
Copyright notice ©2014, Elsevier
Persistent URL http://hdl.handle.net/10536/DRO/DU:30071941

Document type: Journal Article
Collection: Institute for Frontier Materials
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