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A disclination model for twinning and de-twinning of nanotwinned copper

Xie, Chao, Fang, Qihong, Li, Luoxing, Chen, Jiankeng, Zhang, Minghua, Liu, Youwen and Rolfe, Bernard 2016, A disclination model for twinning and de-twinning of nanotwinned copper, Philosophical magazine, vol. 96, no. 3, pp. 301-309, doi: 10.1080/14786435.2015.1132016.

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Title A disclination model for twinning and de-twinning of nanotwinned copper
Author(s) Xie, Chao
Fang, Qihong
Li, Luoxing
Chen, Jiankeng
Zhang, Minghua
Liu, Youwen
Rolfe, BernardORCID iD for Rolfe, Bernard orcid.org/0000-0001-8516-6170
Journal name Philosophical magazine
Volume number 96
Issue number 3
Start page 301
End page 309
Total pages 9
Publisher Taylor & Francis
Place of publication Abingdon, Eng.
Publication date 2016
ISSN 1478-6435
1478-6443
Keyword(s) twinning
de-twinning
disclination quadrupole
nanotwinned copper
Summary The twinning and de-twinning processes within grains of nanotwinned copper (nt-Cu) are schematically demonstrated using the concept of wedge disclination quadrupoles. The stable twin nucleus size and the equilibrium equation of the applied shear stress and twin width during twin growth are obtained. The dependence of the critical resolved shear stress for twinning on the grain size, which conforms to the classic Hall–Petch relationship, is theoretically modelled. Additionally, the disclination quadrupole model for de-twinning is used to interpret the strength softening in nt-Cu. Relative to the classic kinetic and energetic models, this novel approach is more compatible with the experiments.
Language eng
DOI 10.1080/14786435.2015.1132016
Field of Research 010107 Mathematical Logic, Set Theory, Lattices and Universal Algebra
Socio Economic Objective 970109 Expanding Knowledge in Engineering
HERDC Research category C1 Refereed article in a scholarly journal
ERA Research output type C Journal article
Copyright notice ©2016, Taylor & Francis
Persistent URL http://hdl.handle.net/10536/DRO/DU:30085558

Document type: Journal Article
Collection: School of Engineering
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