High temperature nanoscratching of single crystal silicon under reduced oxygen condition

Chavoshi, Saeed Zare, Corujeira Gallo, Santiago, Dong, Hanshan and Luo, Xichun 2017, High temperature nanoscratching of single crystal silicon under reduced oxygen condition, Materials science and engineering: A, vol. 684, pp. 385-393, doi: 10.1016/j.msea.2016.11.097.

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Title High temperature nanoscratching of single crystal silicon under reduced oxygen condition
Author(s) Chavoshi, Saeed Zare
Corujeira Gallo, SantiagoORCID iD for Corujeira Gallo, Santiago orcid.org/0000-0002-7305-2931
Dong, Hanshan
Luo, Xichun
Journal name Materials science and engineering: A
Volume number 684
Start page 385
End page 393
Total pages 9
Publisher Elsevier
Place of publication Amsterdam, The Netherlands
Publication date 2017-01-27
ISSN 0921-5093
Keyword(s) high temperature
single crystal silicon
Summary Abstract In-situ high temperature nanoscratching of Si(110) wafer under reduced oxygen condition was carried out for the first time using a Berkovich tip with a ramp load at low and high scratching speeds. Ex-situ Raman spectroscopy and AFM analysis were performed to characterize high pressure phase transformation, nanoscratch topography and nanoscratch hardness. No remnants of high pressure silicon phases were observed along all the nanoscratch residual tracks in high temperature nanoscratching, whereas in room temperature nanoscratching, phase transformation showed a significant dependence on the applied load and scratching speed i.e. the deformed volume inside the nanoscratch made at room temperature was comprised of Si-I, Si-XII and Si-III above different threshold loads at low and high scratching speeds. Further analysis through AFM measurements demonstrated that the scratch hardness and residual scratch morphologies i.e. scratch depth, scratch width and total pile-up heights are greatly affected by the wafer temperature and scratching speed.
Language eng
DOI 10.1016/j.msea.2016.11.097
Field of Research 091207 Metals and Alloy Materials
0912 Materials Engineering
0913 Mechanical Engineering
Socio Economic Objective 869999 Manufacturing not elsewhere classified
HERDC Research category C1.1 Refereed article in a scholarly journal
Copyright notice ©2016, Elsevier
Persistent URL http://hdl.handle.net/10536/DRO/DU:30089878

Document type: Journal Article
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