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Unclonable plasmonic security labels achieved by shadow-mask-lithography-assisted self-assembly

Zheng, Yuanhui, Jiang, Cheng, Ng, Soon Hock, Lu, Yong, Han, Fei, Bach, Udo and Gooding, J. Justin 2016, Unclonable plasmonic security labels achieved by shadow-mask-lithography-assisted self-assembly, Advanced materials, vol. 28, no. 12, pp. 2330-2336, doi: 10.1002/adma.201505022.

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Title Unclonable plasmonic security labels achieved by shadow-mask-lithography-assisted self-assembly
Author(s) Zheng, Yuanhui
Jiang, Cheng
Ng, Soon Hock
Lu, Yong
Han, Fei
Bach, Udo
Gooding, J. Justin
Journal name Advanced materials
Volume number 28
Issue number 12
Start page 2330
End page 2336
Total pages 7
Publisher Wiley-Blackwell
Place of publication Chichester, Eng.
Publication date 2016-03
ISSN 0935-9648
Language eng
DOI 10.1002/adma.201505022
Field of Research 02 Physical Sciences
03 Chemical Sciences
09 Engineering
HERDC Research category C1.1 Refereed article in a scholarly journal
ERA Research output type C Journal article
Copyright notice ©2016, Wiley-VCH
Persistent URL http://hdl.handle.net/10536/DRO/DU:30103805

Document type: Journal Article
Collection: School of Life and Environmental Sciences
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