Nanoscale density variations induced by high energy heavy ions in amorphous silicon nitride and silicon dioxide

Mota Santiago, Pablo, Vazquez, H, Bierschenk, T, Kremer, F, Nadzri, A, Schauries, D, Djurabekova, F, Nordlund, K, Trautmann, C, Mudie, S, Ridgway, MC and Kluth, P 2018, Nanoscale density variations induced by high energy heavy ions in amorphous silicon nitride and silicon dioxide, Nanotechnology, vol. 29, no. 14, pp. 1-13, doi: 10.1088/1361-6528/aaabdb.

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Title Nanoscale density variations induced by high energy heavy ions in amorphous silicon nitride and silicon dioxide
Author(s) Mota Santiago, PabloORCID iD for Mota Santiago, Pablo orcid.org/0000-0002-1537-4318
Vazquez, H
Bierschenk, T
Kremer, F
Nadzri, A
Schauries, D
Djurabekova, F
Nordlund, K
Trautmann, C
Mudie, S
Ridgway, MC
Kluth, P
Journal name Nanotechnology
Volume number 29
Issue number 14
Article ID 144004
Start page 1
End page 13
Total pages 13
Publisher IOP Publishing
Place of publication Bristol, Eng.
Publication date 2018-04-06
ISSN 1361-6528
Keyword(s) swift heavy ion irradiation
ion tracks
silica
silicon nitride
SAXS
Science & Technology
Technology
Physical Sciences
Nanoscience & Nanotechnology
Materials Science, Multidisciplinary
Physics, Applied
Materials Science
Physics
Language eng
DOI 10.1088/1361-6528/aaabdb
Field of Research MD Multidisciplinary
HERDC Research category C1 Refereed article in a scholarly journal
Copyright notice ©2018, IOP Publishing Ltd
Persistent URL http://hdl.handle.net/10536/DRO/DU:30118742

Document type: Journal Article
Collections: Institute for Frontier Materials
GTP Research
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