Inter-laboratory note: Chemical generation of silicon tetrafluoride with direct current plasma atomic emission spectrometry for the determination of fluorine

Barnett, Neil, Beere, Hugh, Ebdon, Les and Fairman, Ben 1989, Inter-laboratory note: Chemical generation of silicon tetrafluoride with direct current plasma atomic emission spectrometry for the determination of fluorine, Journal of Analytical Atomic Spectrometry, vol. 4, no. 8, pp. 805-806, doi: 10.1039/JA9890400805.

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Title Inter-laboratory note: Chemical generation of silicon tetrafluoride with direct current plasma atomic emission spectrometry for the determination of fluorine
Author(s) Barnett, Neil
Beere, Hugh
Ebdon, Les
Fairman, Ben
Journal name Journal of Analytical Atomic Spectrometry
Volume number 4
Issue number 8
Start page 805
End page 806
Total pages 2
Publisher Royal Society of Chemistry
Place of publication Cambridge, Eng.
Publication date 1989-12
ISSN 0267-9477
1364-5544
Keyword(s) flourine determination
vapour generation
silicon tetrafluoride generation
direct current plasma
atomic emission spectrometry
Language eng
DOI 10.1039/JA9890400805
Indigenous content off
Field of Research 0301 Analytical Chemistry
0306 Physical Chemistry (incl. Structural)
HERDC Research category CN.1 Other journal article
Copyright notice ©1989, The Royal Society of Chemistry
Persistent URL http://hdl.handle.net/10536/DRO/DU:30126206

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