Performance of Co/Al2O3/NiFe magnetic tunnel junctions prepared by a two-step rf plasma oxidation method

Yoon, KS, Park, JH, Choi, Jinho H, Yang, JY, Lee, CH, Kim, CO, Hong, JP and Kang, TW 2001, Performance of Co/Al2O3/NiFe magnetic tunnel junctions prepared by a two-step rf plasma oxidation method, Applied Physics Letters, vol. 79, no. 8, pp. 1160-1162, doi: 10.1063/1.1391407.

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Title Performance of Co/Al2O3/NiFe magnetic tunnel junctions prepared by a two-step rf plasma oxidation method
Author(s) Yoon, KS
Park, JH
Choi, Jinho HORCID iD for Choi, Jinho H orcid.org/0000-0002-4895-6680
Yang, JY
Lee, CH
Kim, CO
Hong, JP
Kang, TW
Journal name Applied Physics Letters
Volume number 79
Issue number 8
Start page 1160
End page 1162
Total pages 3
Publisher AMER INST PHYSICS
Publication date 2001-08-20
ISSN 0003-6951
1077-3118
Keyword(s) Science & Technology
Physical Sciences
Physics, Applied
Physics
MAGNETORESISTANCE
Language eng
DOI 10.1063/1.1391407
Indigenous content off
Field of Research 02 Physical Sciences
09 Engineering
10 Technology
HERDC Research category CN.1 Other journal article
Persistent URL http://hdl.handle.net/10536/DRO/DU:30127551

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