Low temperature removal of surface oxides and hydrocarbons from Ge(100) using atomic hydrogen

Walker, M., Tedder, M.S., Palmer, J.D., Mudd, J.J. and McConville, C.F. 2016, Low temperature removal of surface oxides and hydrocarbons from Ge(100) using atomic hydrogen, Applied Surface Science, vol. 379, pp. 1-7, doi: 10.1016/j.apsusc.2016.02.190.

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Title Low temperature removal of surface oxides and hydrocarbons from Ge(100) using atomic hydrogen
Author(s) Walker, M.
Tedder, M.S.
Palmer, J.D.
Mudd, J.J.
McConville, C.F.ORCID iD for McConville, C.F. orcid.org/0000-0003-1040-2794
Journal name Applied Surface Science
Volume number 379
Start page 1
End page 7
Total pages 7
Publisher Elsevier
Place of publication Amsterdam, The Netherlands
Publication date 2016-08-30
ISSN 0169-4332
1873-5584
Keyword(s) Science & Technology
Physical Sciences
Technology
Chemistry, Physical
Materials Science, Coatings & Films
Physics, Applied
Physics, Condensed Matter
Chemistry
Materials Science
Physics
Germanium
Atomic hydrogen cleaning
Surface cleaning
X-ray photoelectron spectroscopy
Low energy electron diffraction
Ultraviolet photoelectron spectroscopy
TUNNELING-MICROSCOPY
PLASMON EXCITATIONS
ASYMMETRIC DIMERS
DAMAGE
RECONSTRUCTION
FABRICATION
ADSORPTION
INSB(100)
QUALITY
Language eng
DOI 10.1016/j.apsusc.2016.02.190
Indigenous content off
HERDC Research category C1 Refereed article in a scholarly journal
Persistent URL http://hdl.handle.net/10536/DRO/DU:30141909

Document type: Journal Article
Collection: Office of the Deputy Vice-Chancellor (Research)
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