Multilayer InSe-Te van der Waals Heterostructures with an Ultrahigh Rectification Ratio and Ultrasensitive Photoresponse
Qin, F, Gao, F, Dai, M, Hu, Y, Yu, M, Wang, Lifeng, Feng, W, Li, B and Hu, PA 2020, Multilayer InSe-Te van der Waals Heterostructures with an Ultrahigh Rectification Ratio and Ultrasensitive Photoresponse, ACS Applied Materials and Interfaces, vol. 12, no. 33, pp. 37313-37319, doi: 10.1021/acsami.0c08461.
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Multilayer InSe-Te van der Waals Heterostructures with an Ultrahigh Rectification Ratio and Ultrasensitive Photoresponse
National KeyR&D Program of China (no. 2019YFA0705204) National Natural Science Foundation of China (NSFC, no. 51802038) hina Postdoctoral Science Foundation funded project (nos. 2019T120246 and 2018M630329)
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