Controlled oxide removal for the preparation of damage-free InAs(110) surfaces

Veal, TD and McConville, Christopher F 2000, Controlled oxide removal for the preparation of damage-free InAs(110) surfaces, Applied Physics Letters, vol. 77, no. 11, pp. 1665-1667, doi: 10.1063/1.1310211.

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Title Controlled oxide removal for the preparation of damage-free InAs(110) surfaces
Author(s) Veal, TD
McConville, Christopher FORCID iD for McConville, Christopher F orcid.org/0000-0003-1040-2794
Journal name Applied Physics Letters
Volume number 77
Issue number 11
Article ID PII [S0003-6951(00)05537-6]
Start page 1665
End page 1667
Total pages 3
Publisher AMER INST PHYSICS
Publication date 2000-09-11
ISSN 0003-6951
1077-3118
Keyword(s) Science & Technology
Physical Sciences
Physics, Applied
Physics
ENERGY-LOSS SPECTROSCOPY
ATOMIC-HYDROGEN
PLASMON EXCITATIONS
ACCUMULATION LAYER
INAS(001)
GAAS
Language eng
DOI 10.1063/1.1310211
Indigenous content off
Field of Research 02 Physical Sciences
09 Engineering
10 Technology
HERDC Research category C1 Refereed article in a scholarly journal
Persistent URL http://hdl.handle.net/10536/DRO/DU:30142300

Document type: Journal Article
Collection: Office of the Deputy Vice-Chancellor (Research)
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