Determination of the erosion rate in the transient region of an ultralow energy secondary ion mass spectrometry profile using medium energy ion scattering

McConville, Christopher, Al-Harthi, SH, Dowsett, MG, Gard, FS, Ormsby, TJ, Guzman, B, Noakes, TCQ and Bailey, P 2002, Determination of the erosion rate in the transient region of an ultralow energy secondary ion mass spectrometry profile using medium energy ion scattering, Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, vol. 20, no. 4, pp. 1690-1698, doi: 10.1116/1.1491987.


Title Determination of the erosion rate in the transient region of an ultralow energy secondary ion mass spectrometry profile using medium energy ion scattering
Author(s) McConville, ChristopherORCID iD for McConville, Christopher orcid.org/0000-0003-1040-2794
Al-Harthi, SH
Dowsett, MG
Gard, FS
Ormsby, TJ
Guzman, B
Noakes, TCQ
Bailey, P
Journal name Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume number 20
Issue number 4
Start page 1690
End page 1698
Total pages 9
Publisher A V S AMER INST PHYSICS
Place of publication SANTA FE, NM
Publication date 2002-07-01
ISSN 1071-1023
Keyword(s) Science & Technology
Technology
Physical Sciences
Engineering, Electrical & Electronic
Nanoscience & Nanotechnology
Physics, Applied
Engineering
Science & Technology - Other Topics
Physics
OXYGEN
BOMBARDMENT
OXIDATION
SILICON
Language eng
DOI 10.1116/1.1491987
Indigenous content off
Field of Research 0401 Atmospheric Sciences
0901 Aerospace Engineering
0912 Materials Engineering
HERDC Research category C1.1 Refereed article in a scholarly journal
Persistent URL http://hdl.handle.net/10536/DRO/DU:30142314

Document type: Journal Article
Collection: Office of the Deputy Vice-Chancellor (Research)
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