Establishing an accurate depth-scale calibration in the top few nanometers of an ultrashallow implant profile

Dowsett, MG, Al-Harthi, SH, Ormsby, TJ, Guzmán, B, Gard, FS, Noakes, TCQ, Bailey, P and McConville, Christopher F 2002, Establishing an accurate depth-scale calibration in the top few nanometers of an ultrashallow implant profile, Physical Review B - Condensed Matter and Materials Physics, vol. 65, no. 11, pp. 1-4, doi: 10.1103/PhysRevB.65.113412.

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Title Establishing an accurate depth-scale calibration in the top few nanometers of an ultrashallow implant profile
Author(s) Dowsett, MG
Al-Harthi, SH
Ormsby, TJ
Guzmán, B
Gard, FS
Noakes, TCQ
Bailey, P
McConville, Christopher FORCID iD for McConville, Christopher F orcid.org/0000-0003-1040-2794
Journal name Physical Review B - Condensed Matter and Materials Physics
Volume number 65
Issue number 11
Article ID ARTN 113412
Start page 1
End page 4
Total pages 4
Publisher AMER PHYSICAL SOC
Publication date 2002-01-01
ISSN 1098-0121
1550-235X
Keyword(s) Science & Technology
Technology
Physical Sciences
Materials Science, Multidisciplinary
Physics, Applied
Physics, Condensed Matter
Materials Science
Physics
SIMS
SILICON
Language eng
DOI 10.1103/PhysRevB.65.113412
Indigenous content off
Field of Research 02 Physical Sciences
03 Chemical Sciences
09 Engineering
HERDC Research category C1 Refereed article in a scholarly journal
Persistent URL http://hdl.handle.net/10536/DRO/DU:30142319

Document type: Journal Article
Collection: Office of the Deputy Vice-Chancellor (Research)
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