Determination of the variation in sputter yield in the SIMS transient region using MEIS

Dowsett, MG, Ormsby, TJ, Gard, FS, Al-Harthi, SH, Guzmán, B, McConville, Christopher F, Noakes, TCQ and Bailey, P 2003, Determination of the variation in sputter yield in the SIMS transient region using MEIS, Applied Surface Science, vol. 203-204, pp. 363-366, doi: 10.1016/S0169-4332(02)00879-6.

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Title Determination of the variation in sputter yield in the SIMS transient region using MEIS
Author(s) Dowsett, MG
Ormsby, TJ
Gard, FS
Al-Harthi, SH
Guzmán, B
McConville, Christopher FORCID iD for McConville, Christopher F orcid.org/0000-0003-1040-2794
Noakes, TCQ
Bailey, P
Journal name Applied Surface Science
Volume number 203-204
Article ID PII S0169-4332(02)00879-6
Start page 363
End page 366
Total pages 4
Publisher ELSEVIER SCIENCE BV
Place of publication NARA, JAPAN
Publication date 2003-01-15
ISSN 0169-4332
Keyword(s) Science & Technology
Physical Sciences
Technology
Chemistry, Physical
Materials Science, Coatings & Films
Physics, Applied
Physics, Condensed Matter
Chemistry
Materials Science
Physics
erosion rate
depth calibration
ultra-low energy SIMS
ultra-shallow junction
transient region
OXYGEN
Language eng
DOI 10.1016/S0169-4332(02)00879-6
Indigenous content off
HERDC Research category C1 Refereed article in a scholarly journal
Persistent URL http://hdl.handle.net/10536/DRO/DU:30142322

Document type: Journal Article
Collection: Office of the Deputy Vice-Chancellor (Research)
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