A two dimensional analytical model of drain to source current and subthreshold slope of a triple material double gate MOSFET

A two dimensional analytical model of drain to source current as well as subthreshold slope of a triple material double gate MOSFET has been developed in this work. Basic drift-diffusion equation has been used to derive the drain to source current model. An expression of pinch-off voltage has been derived for modeling drain current in saturation region. The current in the device has been studied as function of drain to source voltage and gate voltage as well. In the work, leakage current in zero gate bias condition has also been presented. Variations in subthreshold slope of the device owing to change in device parameters have been lifted up. Our model results have been verified with the simulation data obtained by using a professional numerical device simulator.