Bas-relief layout arrangement via automatic method optimization
Version 2 2024-06-13, 16:39Version 2 2024-06-13, 16:39
Version 1 2021-06-28, 08:19Version 1 2021-06-28, 08:19
conference contribution
posted on 2024-06-13, 16:39authored byJ Mao, T Li, F Zhang, M Wang, J Chang, X Lu
It is significant to achieve automatic arrangement for bas-relief layout which can be noticeably more efficient than the time-consuming manual process. In fact, nearly none work has been reported in terms of bas-relief layout arrangement. In this paper, we propose a novel approach to tackle this problem. Specifically, we first identify the evaluation indicators to account for different aesthetic factors, and model the goodness of each indicator. We then cast the bas-relief layout as a combinatorial optimization problem based on those evaluation indicators and a geometric mean model. The contribution of this paper is to propose an objective function for bas-relief layout and apply simulated annealing algorithm for optimization. Experiments show that our method is effective, in terms of layout arrangement for bas-relief generation. In addition, this method can synthesize a few models arrangement and investigate which evaluation indicators will affect the aesthetic perception of the bas-relief.