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Bivariate probability-based anomaly detection

conference contribution
posted on 2015-03-16, 00:00 authored by H Lou, Ye ZhuYe Zhu
Statistical techniques play a crucial role in anomaly detection. Although they usually are simple and can be trained unsupervised, they face three challenges: parametric techniques usually rely on the assumption that the data meet a special distribution; existing Histogram-based techniques only take account of individual attribute, which cannot capture the interactions between different attributes; some statistical techniques still need labeled data for training or validation. In order to overcome these drawbacks, this paper proposes a different statistic method to justify the data instances. The proposed method, named Bivariate Probability based Anomaly Score (BPAS) algorithm, builds an ensemble of Bivariate Probability (BP) models for a given data set, and each model calculates the probability distribution for the combination of intervals from two attributes. The anomalies will be detected when they occur in these low probability combination. The empirical evaluation presents that BPAS works favorably to LOF, ORCA and ¡Forest on different types of real data sets in terms of AUC. Its performance is relative stable when key parameters changes. BPAS also performs well in categorical data sets and the data sets that contain normal instances only. Furthermore, it has a linear time complexity of 0(n), which is much lower than distance-based and density-based methods. Thus BPAS has potential ability to become an efficient anomaly detector for high volume and high dimensional databases.

History

Pagination

1-6

Location

Shanghai, China

Start date

2014-10-30

End date

2014-11-01

Language

eng

Publication classification

E Conference publication, E1.1 Full written paper - refereed

Title of proceedings

BESC 2014 : International Conference on Behavior, Economic and Social Computing (BESC)

Event

Behavior, Economic and Social Computing. Conference (2014 : Shanghai, China)

Publisher

IEEE

Place of publication

Piscataway, N.J.

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