High-k/Metal Gate Stacks in Gate First and Replacement Gate Schemes

Kesapragada, Sree; Wang, Rongjun; Liu, Dave; Liu, Guojun; Xie, Zhigang; Ge, Zhenbin; Yang, Haichun; Lei, Yu; Lu, Xinliang; Tang, Xianmin; Lei, Jianxin; Allen, Miller; Gandikota, Srinivas; Moraes, Kevin; Hung, Steven; Yoshida, Naomi; Chang, Chorng-Ping

High-k/Metal Gate Stacks in Gate First and Replacement Gate Schemes

conference contribution

posted on 2023-06-29, 05:57 authored by Sree Kesapragada, Rongjun Wang, Dave Liu, Guojun Liu, Zhigang Xie, Zhenbin Ge, Haichun Yang, Yu Lei, Xinliang Lu, Xianmin Tang, Jianxin Lei, Miller Allen, Srinivas Gandikota, Kevin Moraes, Steven Hung, Naomi Yoshida, Chorng-Ping Chang

High-k/Metal Gate Stacks in Gate First and Replacement Gate Schemes

History

Pagination

256-259

Location

San Francisco, Calif.

Publisher DOI

https://doi.org/10.1109/ASMC.2010.5551460

Start date

2010-07-11

End date

2010-07-13

ISSN

1078-8743

eISSN

2376-6697

ISBN-13

978-1-4244-6519-4

Language

English

Publication classification

E1.1 Full written paper - refereed

Title of proceedings

ASMC 2010 : Proceedings of the IEEE/SEMI IEEE/SEMI Conference on Advanced Semiconductor Manufacturing 2010

Event

IEEE/SEMI Conference on Advanced Semiconductor Manufacturing. (2010 : San Francisco, Calif.)

Publisher

IEEE

Place of publication

Piscataway, N.J.

Series

Advanced Semiconductor Manufacturing Conference and Workshop-Proceedings

Publication URL

http://dx.doi.org/10.1109/asmc.2010.5551460

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Keywords

Engineering Engineering, Electrical & Electronic Science & Technology Technology WORK FUNCTION

High-k/Metal Gate Stacks in Gate First and Replacement Gate Schemes

History

Pagination

Location

Publisher DOI

Start date

End date

ISSN

eISSN

ISBN-13

Language

Publication classification

Title of proceedings

Event

Publisher

Place of publication

Series

Publication URL

Usage metrics

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Keywords

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