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Use of focused ion beam milling for patterned growth of carbon nanotubes

conference contribution
posted on 2008-12-01, 00:00 authored by J Yu, Ying (Ian) ChenYing (Ian) Chen, H Chen, J S Williams
Focused ion beam milling was used to create trenches on Si wafer surface as the template and carbon nanotubes (CNTs) only nucleated and grew inside the trenches under a controlled pyrolysis process of iron phthalocyanine at 1000 °C. Using this new template technique, CNTs in various patterns were formed on Si surface without pre-deposition of metal catalysts. The selective growth in the trenches is due to special morphology, surface crystalline structure and capillarity effect. © 2008 Materials Research Society.

History

Volume

1089

Pagination

17 - 23

Publisher

Cambridge University Press

Location

San Francisco, Calif.

Place of publication

Cambridge, Eng.

Start date

2008-03-24

End date

2008-03-28

ISSN

0272-9172

ISBN-13

9781605608761

Publication classification

EN.1 Other conference paper

Title of proceedings

Materials Research Society Symposium Proceedings

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