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Atomic layer deposition of transition metal films and nanostructures for electronic and catalytic applications
journal contribution
posted on 2021-01-01, 00:00 authored by James MainaJames Maina, Andrea Merenda, M Weber, Jenny PringleJenny Pringle, M Bechelany, L Hyde, Ludovic DumeeLudovic DumeeAtomic layer deposition of transition metal films and nanostructures for electronic and catalytic applications
History
Journal
Critical Reviews in Solid State and Materials SciencesVolume
46Issue
5Pagination
468 - 489Publisher
TAYLOR & FRANCIS INCPublisher DOI
ISSN
1040-8436eISSN
1547-6561Language
EnglishPublication classification
C Journal article; CN Other journal articleUsage metrics
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Keywords
Science & TechnologyTechnologyPhysical SciencesMaterials Science, MultidisciplinaryPhysics, Condensed MatterMaterials SciencePhysicsAtomic layer deposition (ALD)transition metalsnanostructureselectronic applicationscatalytic applicationsPLASMA ALD METHODTHIN-FILMSCOPPER METALNIGROWTHNANOPARTICLESCOCUELECTROCATALYSTSREDUCTION