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Binocular processes in vernier acuity
journal contribution
posted on 1995-01-01, 00:00 authored by Alexander MussapAlexander Mussap, D M LeviWe investigate the role of binocular mechanisms in vernier acuity, using dichoptic variants of spatial-frequency masking and flank-line interference paradigms. The finding that grating masks and flanking lines presented to one eye elevate (worsen) thresholds for detecting vernier offsets presented to the other eye suggests that neural mechanisms mediating vernier acuity receive binocular inputs, thus placing the loci of these mechanisms at postreceptoral sites. The observation that these threshold elevation effects are orientation dependent is consistent with a contribution to vernier acuity from oriented cortical filters.
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Journal
Journal of the optical society of America AVolume
12Issue
2Pagination
225 - 233Publisher
Optical Society of AmericaLocation
Washington, D.C.Publisher DOI
ISSN
1084-7529eISSN
1520-8532Language
engPublication classification
C1.1 Refereed article in a scholarly journalCopyright notice
1995, Optical Society of AmericaUsage metrics
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