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Characterisation of Ni–Ti thin films produced by filtered arc deposition

journal contribution
posted on 2008-01-25, 00:00 authored by N Stanford, S Huang, D Dunne
Ti–49.5 at%Ni thin films have been formed by deposition onto Si and glass substrates using a filtered arc deposition system (FADS). The films deposited on glass were composed of nanocrystalline parent phase grains contained within an amorphous matrix. The films deposited onto silicon were crystalline, and were largely parent phase whereas a bulk alloy of the same composition would be expected to be martensite. The stabilisation of the parent phase is proposed to be a grain size effect, with the critical grain size for parent phase stabilisation being about 30 nm.

History

Journal

Materials science and engineering A: structural materials: properties, microstructures and processing

Volume

473

Issue

1-2

Pagination

172 - 179

Publisher

Elsevier SA

Location

Lausanne, Switzerland

ISSN

0921-5093

eISSN

1873-4936

Language

eng

Publication classification

C1 Refereed article in a scholarly journal

Copyright notice

2007, Elsevier B.V.