Controlled oxide removal for the preparation of damage-free InAs(110) surfaces

Veal, TD; McConville, CF

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Controlled oxide removal for the preparation of damage-free InAs(110) surfaces

Version 2 2024-06-18, 23:04

Version 1 2020-09-18, 13:57

journal contribution

posted on 2024-06-18, 23:04 authored by TD Veal, CF McConville

Controlled oxide removal for the preparation of damage-free InAs(110) surfaces

History

Journal

Applied Physics Letters

Volume

77

Article number

PII [S0003-6951(00)05537-6]

Pagination

1665-1667

Publisher DOI

https://doi.org/10.1063/1.1310211

ISSN

0003-6951

eISSN

1077-3118

Language

English

Author URL

http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcApp=PARTNER_APP&SrcAuth=LinksAMR&KeyUT=WOS:000089170700033&DestLinkType=FullRecord&DestApp=ALL_WOS&UsrCustomerID=a045e4b2bb1f2b747c68c720ec8913b7

Publication classification

C1 Refereed article in a scholarly journal

Issue

11

Publisher

AMER INST PHYSICS

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Keywords

Science & Technology Physical Sciences Physics, Applied Physics ENERGY-LOSS SPECTROSCOPY ATOMIC-HYDROGEN PLASMON EXCITATIONS ACCUMULATION LAYER INAS(001)GAAS Technology

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File(s) under permanent embargo

Controlled oxide removal for the preparation of damage-free InAs(110) surfaces

History

Journal

Volume

Article number

Pagination

Publisher DOI

ISSN

eISSN

Language

Author URL

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Issue

Publisher

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