Corrosion properties of plasma-polymerized methylcyclohexane films using electrochemical methods

Three types of methylcyclohexane (MCH) coating were deposited as interlayer dielectrics on copper using plasma-enhanced chemical vapor deposition (PECVD) at three different RF plasma power levels. The coating performance was then evaluated by an electrochemical im pedance spectroscopy (EIS) and a potentiodynamic polarization test in 3.5 wt.% NaCl solution. An atomic force microscopy (AFM) and Fourier transform infrared reflection (FT-IR) spectroscopy were also conducted to analyze the coatings. The MCH coatings showed a lower corrosion rate than the copper substrate in the potentiodynamic tests. The EIS results showed that the corrosion resistance of the coatings increased with an increasing plasma power. Thus, the MCH films with an increasing plasma power improved the corrosion resistance due to the formation of a low-porosity coating, the enhanced formation of C−H, C−C, and C≡C stretching configurations, and the improved smooth surfaces.