Determination of the variation in sputter yield in the SIMS transient region using MEIS

journal contribution

posted on 2024-06-18, 23:04 authored by MG Dowsett, TJ Ormsby, FS Gard, SH Al-Harthi, B Guzmán, CF McConville, TCQ Noakes, P Bailey

Determination of the variation in sputter yield in the SIMS transient region using MEIS

History

Journal

Applied Surface Science

Volume

203-204

Article number

PII S0169-4332(02)00879-6

Pagination

363-366

Location

NARA, JAPAN

Publisher DOI

https://doi.org/10.1016/S0169-4332(02)00879-6

ISSN

0169-4332

Language

English

Author URL

http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcApp=PARTNER_APP&SrcAuth=LinksAMR&KeyUT=WOS:000180527300082&DestLinkType=FullRecord&DestApp=ALL_WOS&UsrCustomerID=a045e4b2bb1f2b747c68c720ec8913b7

Publication classification

C1 Refereed article in a scholarly journal

Publisher

ELSEVIER SCIENCE BV

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Keywords

Science & Technology Physical Sciences Technology Chemistry, Physical Materials Science, Coatings & Films Physics, Applied Physics, Condensed Matter Chemistry Materials Science Physics erosion rate depth calibration ultra-low energy SIMS ultra-shallow junction transient region OXYGEN MD Multidisciplinary

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All Rights Reserved

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