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Electromagnetic Functionalization of Wide-Bandgap Dielectric Oxides by Boron Interstitial Doping

Version 2 2024-06-13, 12:12
Version 1 2021-01-15, 08:23
journal contribution
posted on 2024-06-13, 12:12 authored by DS Park, GJ Rees, H Wang, D Rata, AJ Morris, IV Maznichenko, S Ostanin, A Bhatnagar, CJ Choi, RDB Jónsson, K Kaufmann, R Kashtiban, M Walker, CT Chiang, EB Thorsteinsson, Z Luo, IS Park, JV Hanna, I Mertig, K Dörr, HP Gíslason, CF McConville
Electromagnetic Functionalization of Wide-Bandgap Dielectric Oxides by Boron Interstitial Doping

History

Journal

Advanced Materials

Volume

30

Article number

ARTN 1802025

Pagination

1 - 9

Location

Germany

ISSN

0935-9648

eISSN

1521-4095

Language

English

Publication classification

C1 Refereed article in a scholarly journal

Issue

39

Publisher

WILEY-V C H VERLAG GMBH