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Electromagnetic Functionalization of Wide-Bandgap Dielectric Oxides by Boron Interstitial Doping

journal contribution
posted on 2018-09-01, 00:00 authored by D S Park, G J Rees, H Wang, D Rata, A J Morris, I V Maznichenko, S Ostanin, A Bhatnagar, C J Choi, R D B Jónsson, K Kaufmann, R Kashtiban, M Walker, C T Chiang, E B Thorsteinsson, Z Luo, I S Park, J V Hanna, I Mertig, K Dörr, H P Gíslason, Chris McConville
Electromagnetic Functionalization of Wide-Bandgap Dielectric Oxides by Boron Interstitial Doping

History

Journal

Advanced Materials

Volume

30

Issue

39

Article number

1802025

Pagination

1 - 9

Publisher

Wiley

Location

Chichester, Eng.

ISSN

0935-9648

eISSN

1521-4095

Language

eng

Publication classification

C1 Refereed article in a scholarly journal