Electromagnetic Functionalization of Wide-Bandgap Dielectric Oxides by Boron Interstitial Doping

Park, DS; Rees, GJ; Wang, H; Rata, D; Morris, AJ; Maznichenko, IV; Ostanin, S; Bhatnagar, A; Choi, CJ; Jónsson, RDB; Kaufmann, K; Kashtiban, R; Walker, M; Chiang, CT; Thorsteinsson, EB; Luo, Z; Park, IS; Hanna, JV; Mertig, I; Dörr, K; Gíslason, HP; McConville, CF

Electromagnetic Functionalization of Wide-Bandgap Dielectric Oxides by Boron Interstitial Doping

Version 2 2024-06-13, 12:12

Version 1 2021-01-15, 08:23

journal contribution

posted on 2024-06-13, 12:12 authored by DS Park, GJ Rees, H Wang, D Rata, AJ Morris, IV Maznichenko, S Ostanin, A Bhatnagar, CJ Choi, RDB Jónsson, K Kaufmann, R Kashtiban, M Walker, CT Chiang, EB Thorsteinsson, Z Luo, IS Park, JV Hanna, I Mertig, K Dörr, HP Gíslason, CF McConville

Electromagnetic Functionalization of Wide-Bandgap Dielectric Oxides by Boron Interstitial Doping

History

Journal

Advanced Materials

Volume

30

Article number

ARTN 1802025

Pagination

1 - 9

Location

Germany

Publisher DOI

https://doi.org/10.1002/adma.201802025

ISSN

0935-9648

eISSN

1521-4095

Language

English

Author URL

http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcApp=PARTNER_APP&SrcAuth=LinksAMR&KeyUT=WOS:000445327500008&DestLinkType=FullRecord&DestApp=ALL_WOS&UsrCustomerID=a045e4b2bb1f2b747c68c720ec8913b7

Publication classification

C1 Refereed article in a scholarly journal

Issue

39

Publisher

WILEY-V C H VERLAG GMBH

Electromagnetic Functionalization of Wide-Bandgap Dielectric Oxides by Boron Interstitial Doping

History

Journal

Volume

Article number

Pagination

Location

Publisher DOI

ISSN

eISSN

Language

Author URL

Publication classification

Issue

Publisher

Usage metrics

Categories

Keywords

Licence

Exports