Establishing an accurate depth-scale calibration in the top few nanometers of an ultrashallow implant profile

Dowsett, MG; Al-Harthi, SH; Ormsby, TJ; Guzmán, B; Gard, FS; Noakes, TCQ; Bailey, P; McConville, CF

Establishing an accurate depth-scale calibration in the top few nanometers of an ultrashallow implant profile

Version 2 2024-06-18, 23:04

Version 1 2020-09-18, 14:20

journal contribution

posted on 2024-06-18, 23:04 authored by MG Dowsett, SH Al-Harthi, TJ Ormsby, B Guzmán, FS Gard, TCQ Noakes, P Bailey, CF McConville

Establishing an accurate depth-scale calibration in the top few nanometers of an ultrashallow implant profile

History

Journal

Physical Review B - Condensed Matter and Materials Physics

Volume

65

Article number

ARTN 113412

Pagination

1-4

Publisher DOI

https://doi.org/10.1103/PhysRevB.65.113412

ISSN

1098-0121

eISSN

1550-235X

Language

English

Author URL

http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcApp=PARTNER_APP&SrcAuth=LinksAMR&KeyUT=WOS:000174548400037&DestLinkType=FullRecord&DestApp=ALL_WOS&UsrCustomerID=a045e4b2bb1f2b747c68c720ec8913b7

Publication classification

C1 Refereed article in a scholarly journal

Issue

11

Publisher

AMER PHYSICAL SOC

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Keywords

Science & Technology Technology Physical Sciences Materials Science, Multidisciplinary Physics, Applied Physics, Condensed Matter Materials Science Physics SIMS SILICON

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Establishing an accurate depth-scale calibration in the top few nanometers of an ultrashallow implant profile

History

Journal

Volume

Article number

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Publisher DOI

ISSN

eISSN

Language

Author URL

Publication classification

Issue

Publisher

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Keywords

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