Fabrication and characterization of low-loss Al/Si/Al parallel plate capacitors for superconducting quantum information applications (vol 11, 11, 2025)

McFfadden, Anthony P; Goswami, Aranya; Zhao, Tongyu; van Schijndel, Teun; Larson, Trevyn FQ; Sahu, Sudhir; Gill, Stephen; Lecocq, Florent; Simmonds, Raymond; Palmstrom, Chris

Fabrication and characterization of low-loss Al/Si/Al parallel plate capacitors for superconducting quantum information applications (vol 11, 11, 2025)

journal contribution

posted on 2025-05-30, 18:27 authored by Anthony P McFfadden, Aranya Goswami, Tongyu Zhao, Teun van Schijndel, Trevyn FQ Larson, Sudhir Sahu, Stephen GillStephen Gill, Florent Lecocq, Raymond Simmonds, Chris Palmstrom

Fabrication and characterization of low-loss Al/Si/Al parallel plate capacitors for superconducting quantum information applications (vol 11, 11, 2025)

History

Journal

NPJ QUANTUM INFORMATION

Volume

11

Article number

ARTN 53

ISSN

2056-6387

eISSN

2056-6387

Language

English

Publication classification

C4.1 Letter or note

Issue

1

Publisher

NATURE PORTFOLIO

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Keywords

Science & Technology Physical Sciences Quantum Science & Technology Physics, Applied Physics, Atomic, Molecular & Chemical Physics, Condensed Matter Physics

Fabrication and characterization of low-loss Al/Si/Al parallel plate capacitors for superconducting quantum information applications (vol 11, 11, 2025)

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