Frequency Dependent Silica Dissolution Rate Enhancement under Oscillating Pressure via an Electrochemical Pressure Solution-like, Surface Resonance Mechanism
Version 2 2024-06-06, 09:30
Version 1 2022-03-14, 08:26
journal contribution
posted on 2024-06-06, 09:30 authored by Kilian FraysseKilian Fraysse, SP Meaney, Will GatesWill Gates, DP Langley, RF Tabor, PR Stoddart, GW GreeneFrequency Dependent Silica Dissolution Rate Enhancement under Oscillating Pressure via an Electrochemical Pressure Solution-like, Surface Resonance Mechanism
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Journal
Journal of the American Chemical SocietyVolume
144Pagination
3875-3891Location
Washington, D.C.ISSN
0002-7863eISSN
1520-5126Language
engPublication classification
C1 Refereed article in a scholarly journalIssue
9Publisher
Amserican Chemical SocietyUsage metrics
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