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Grafting of N-moieties onto octa-methyl polyhedral oligomeric silsesquioxane microstructures by sequential continuous wave and pulsed plasma
journal contribution
posted on 2017-10-01, 00:00 authored by Xiao Chen, Frank ChenFrank Chen, Ludovic Dumee, Luke O'DellLuke O'Dell, J du Plessis, R d'Agostino, Xiujuan Dai, Kevin MagniezA functionalization of microstructures of polyhedral oligomeric silsesquioxane (POSS) to obtain substrates contain N-moieties, with a probable high selectivity of primary mines is demonstrated for the first time in a low pressure plasma process through a sequential continuous wave plus pulsed mode (CW+P). Selective grafting of N-moieties was performed across octa-methyl POSS micro-powder by substituting hydrogen atoms of the terminal methyl groups during nitrogen/hydrogen (N 2 /H 2 ) gases plasma. As opposed to wet chemical functionalization approaches, the plasma method does not require reactive chemicals and is environmentally friendly. The results demonstrate the efficiency of the treatment (N/Si) reaches 7.1% with an indication of high NH 2 selectivity (NH 2 /N). The amount of primary amines is determined from XPS data after 4-(trifluoromethyl) benzaldehyde (TFBA) chemical derivatization.
History
Journal
Plasma processes and polymersVolume
14Issue
10Article number
1600244Pagination
1 - 10Publisher
WileyLocation
Chichester, Eng.Publisher DOI
ISSN
1612-8850eISSN
1612-8869Language
engPublication classification
C1 Refereed article in a scholarly journalCopyright notice
2017, WileyUsage metrics
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No categories selectedKeywords
amination\/amidationfunctional POSSfunctionalization of polymersplasma treatmentselective graftingScience & TechnologyPhysical SciencesPhysics, AppliedPhysics, Fluids & PlasmasPhysics, Condensed MatterPolymer SciencePhysicsaminationamidationPOSS HYBRID MEMBRANESOXYGEN-ATOM EROSIONAMINE FUNCTIONALIZATIONTHERMAL-PROPERTIESCARBON NANOTUBESNANOCOMPOSITESPOLYMERSDISSOCIATIONSURFACESFILMS
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