Deakin University
Browse

File(s) under permanent embargo

Growth and etching of monolayer hexagonal boron nitride

journal contribution
posted on 2015-09-01, 00:00 authored by Lifeng Wang, B Wu, L Jiang, J Chen, Y Li, W Guo, P Hu, Y Liu
The full spectrum from attachment-kinetic-dominated to diffusion-controlled modes is revealed for the cases of monolayer h-BN chemical vapor deposition (CVD) growth and Ar/H₂ etching. The sets of grown and etched structures exhibit well-defined shape evolution from Euclidian to fractal geometry. The detailed abnormal processes for merging h-BN flakes into continuous structures or film are first observed and explained.

History

Journal

Advanced materials

Volume

27

Pagination

4858-4864

Location

Chichester, Eng.

ISSN

0935-9648

eISSN

1521-4095

Language

eng

Publication classification

C1 Refereed article in a scholarly journal

Issue

33

Publisher

Wiley

Usage metrics

    Research Publications

    Categories

    No categories selected

    Exports

    RefWorks
    BibTeX
    Ref. manager
    Endnote
    DataCite
    NLM
    DC