Growth of high quality AlN films on CVD diamond by RF reactive magnetron sputtering
Version 2 2024-06-13, 10:59
Version 1 2017-10-31, 14:52
journal contribution
posted on 2024-06-13, 10:59 authored by LX Chen, H Liu, S Liu, CM Li, YC Wang, K An, CY Hua, JL Liu, JJ Wei, LF Hei, FX LvGrowth of high quality AlN films on CVD diamond by RF reactive magnetron sputtering
History
Journal
Applied Surface ScienceVolume
431Pagination
152-159Location
Hangzhou, PEOPLES R CHINAISSN
0169-4332eISSN
1873-5584Language
EnglishPublication classification
C Journal article, C1.1 Refereed article in a scholarly journalCopyright notice
2017, Elsevier B.V.Publisher
ELSEVIER SCIENCE BVUsage metrics
Categories
No categories selectedKeywords
Science & TechnologyPhysical SciencesTechnologyChemistry, PhysicalMaterials Science, Coatings & FilmsPhysics, AppliedPhysics, Condensed MatterChemistryMaterials SciencePhysicsAlN filmsBuffer layerBulk resistivityRocking curveHardness and Young's modulusACOUSTIC-WAVE DEVICESALUMINUM NITRIDE FILMSSUBSTRATESchool of Life and Environmental Sciences030603 Colloid and Surface Chemistry040607 Surface ProcessesMD Multidisciplinary3406 Physical chemistry3709 Physical geography and environmental geoscience
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