Inter-laboratory note: Chemical generation of silicon tetrafluoride with direct current plasma atomic emission spectrometry for the determination of fluorine

A method is described for the determination of fluorine in aqueous samples via the chemical generation of silicon tetrafluoride. The generated vapour was swept to a direct current plasma and silicon measured by atomic emission spectrometry. The detection limit obtained for fluorine was 0.9 μg ml^-1 for a 100-μl sample.