Low temperature removal of surface oxides and hydrocarbons from Ge(100) using atomic hydrogen
Version 2 2024-06-18, 23:00
Version 1 2016-08-30, 00:00
journal contribution
posted on 2024-06-18, 23:00 authored by M Walker, MS Tedder, JD Palmer, JJ Mudd, CF McConvilleLow temperature removal of surface oxides and hydrocarbons from Ge(100) using atomic hydrogen
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Location
Amsterdam, The NetherlandsLanguage
engPublication classification
C1 Refereed article in a scholarly journalJournal
Applied Surface ScienceVolume
379Pagination
1-7ISSN
0169-4332eISSN
1873-5584Publisher
ElsevierUsage metrics
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Science & TechnologyPhysical SciencesTechnologyChemistry, PhysicalMaterials Science, Coatings & FilmsPhysics, AppliedPhysics, Condensed MatterChemistryMaterials SciencePhysicsGermaniumAtomic hydrogen cleaningSurface cleaningX-ray photoelectron spectroscopyLow energy electron diffractionUltraviolet photoelectron spectroscopyTUNNELING-MICROSCOPYPLASMON EXCITATIONSASYMMETRIC DIMERSDAMAGERECONSTRUCTIONFABRICATIONTECHNOLOGYADSORPTIONINSB(100)QUALITYMD Multidisciplinary
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