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Maskless photolithography using UV LEDs
journal contributionposted on 2008-01-01, 00:00 authored by Rosanne GuijtRosanne Guijt, M C Breadmore
A UV light emitting diode (LED) with a maximum output of 372 nm was collimated using a pinhole and a small plastic tube and focused using a microscope objective onto a substrate for direct lithographic patterning of the photoresist. Movement of the substrate with a motorised linear stage (syringe pump) allowed lines in SU-8 to be pattered with a width down to 35 microm at a linear velocity of 80 microm s(-1), while in the dry film resist Ordyl SY 330, features as narrow as 17 microm were made at a linear velocity of 245 microm s(-1). At this linear velocity, a 75 mm long feature could be patterned in 5 min. Functional microfluidic devices were made by casting PDMS on a master made by LED lithography. The results show that UV LEDs are a suitable light source for direct writing lithography, offering a budget friendly, and high resolution alternative for rapid prototyping of features smaller than 20 microm.
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Science & TechnologyLife Sciences & BiomedicinePhysical SciencesTechnologyBiochemical Research MethodsChemistry, MultidisciplinaryChemistry, AnalyticalNanoscience & NanotechnologyInstruments & InstrumentationBiochemistry & Molecular BiologyChemistryScience & Technology - Other TopicsMICROFLUIDIC SYSTEMSFABRICATIONPOLY(DIMETHYLSILOXANE)MICROFABRICATIONMICROCHIPCHIPS