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Nanopatterning and electrical tuning of MoS2 layers with a subnanometer helium ion beam
journal contributionposted on 12.08.2015, 00:00 authored by D S Fox, Y Zhou, P Maguire, A O'Neill, C Ó'Coileáin, R Gatensby, Alexey Glushenkov, Tao Tao, G S Duesberg, I V Shvets, M Abid, H C Wu, Ying (Ian) ChenYing (Ian) Chen, J N Coleman, J F Donegan, H Zhang
We report subnanometer modification enabled by an ultrafine helium ion beam. By adjusting ion dose and the beam profile, structural defects were controllably introduced in a few-layer molybdenum disulfide (MoS2) sample and its stoichiometry was modified by preferential sputtering of sulfur at a few-nanometer scale. Localized tuning of the resistivity of MoS2 was demonstrated and semiconducting, metallic-like, or insulating material was obtained by irradiation with different doses of He(+). Amorphous MoSx with metallic behavior has been demonstrated for the first time. Fabrication of MoS2 nanostructures with 7 nm dimensions and pristine crystal structure was also achieved. The damage at the edges of these nanostructures was typically confined to within 1 nm. Nanoribbons with widths as small as 1 nm were reproducibly fabricated. This nanoscale modification technique is a generalized approach that can be applied to various two-dimensional (2D) materials to produce a new range of 2D metamaterials.
Pagination5307 - 5313
PublisherAmerican Chemical Society
LocationWashington, D. C.
Publication classificationC Journal article; C1 Refereed article in a scholarly journal
Copyright notice2015, ACS
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Helium ion beamMoS2electrical tuningnanopatterningnanoribbonstoichiometryScience & TechnologyPhysical SciencesTechnologyChemistry, MultidisciplinaryChemistry, PhysicalNanoscience & NanotechnologyMaterials Science, MultidisciplinaryPhysics, AppliedPhysics, Condensed MatterChemistryScience & Technology - Other TopicsMaterials SciencePhysicsMONOLAYER MOS2NANORIBBONSFABRICATIONTRANSITIONNANOWIRESDAMAGEBULK