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Nanopatterning and electrical tuning of MoS2 layers with a subnanometer helium ion beam

journal contribution
posted on 12.08.2015, 00:00 authored by D S Fox, Y Zhou, P Maguire, A O'Neill, C Ó'Coileáin, R Gatensby, Alexey Glushenkov, Tao Tao, G S Duesberg, I V Shvets, M Abid, H C Wu, Ying (Ian) ChenYing (Ian) Chen, J N Coleman, J F Donegan, H Zhang
We report subnanometer modification enabled by an ultrafine helium ion beam. By adjusting ion dose and the beam profile, structural defects were controllably introduced in a few-layer molybdenum disulfide (MoS2) sample and its stoichiometry was modified by preferential sputtering of sulfur at a few-nanometer scale. Localized tuning of the resistivity of MoS2 was demonstrated and semiconducting, metallic-like, or insulating material was obtained by irradiation with different doses of He(+). Amorphous MoSx with metallic behavior has been demonstrated for the first time. Fabrication of MoS2 nanostructures with 7 nm dimensions and pristine crystal structure was also achieved. The damage at the edges of these nanostructures was typically confined to within 1 nm. Nanoribbons with widths as small as 1 nm were reproducibly fabricated. This nanoscale modification technique is a generalized approach that can be applied to various two-dimensional (2D) materials to produce a new range of 2D metamaterials.

History

Journal

Nano letters

Volume

15

Issue

8

Pagination

5307 - 5313

Publisher

American Chemical Society

Location

Washington, D. C.

eISSN

1530-6992

Language

eng

Publication classification

C Journal article; C1 Refereed article in a scholarly journal

Copyright notice

2015, ACS