Optimisation of anatase TiO 2 thin film growth on LaAlO 3 (0 0 1) using pulsed laser deposition
Version 2 2024-06-18, 23:00
Version 1 2016-12-01, 00:00
journal contribution
posted on 2024-06-18, 23:00 authored by K Krupski, AM Sanchez, A Krupski, CF McConvilleOptimisation of anatase TiO 2 thin film growth on LaAlO 3 (0 0 1) using pulsed laser deposition
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Location
Warsaw, POLANDLanguage
EnglishPublication classification
C1 Refereed article in a scholarly journalJournal
Applied Surface ScienceVolume
388Pagination
684-690ISSN
0169-4332eISSN
1873-5584Publisher
ELSEVIER SCIENCE BVUsage metrics
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No categories selectedKeywords
Science & TechnologyPhysical SciencesTechnologyChemistry, PhysicalMaterials Science, Coatings & FilmsPhysics, AppliedPhysics, Condensed MatterChemistryMaterials SciencePhysicsAnataseTitanium dioxideLanthanum aluminatePulsed laser deposition (PLD)Reflection high-energy electron diffraction (RHEED)Low-energy electron diffraction (LEED)X-ray diffraction (XRD)Atomic force microscopy (AFM)Scanning tunneling microscopy (STM)Scanning transmission electron microscopy (STEM)GrowthThin film growthTRANSMISSION ELECTRON-MICROSCOPYMOLECULAR-BEAM EPITAXYTITANIUM-DIOXIDESURFACESRTIO3RUTILEREACTIVITYINTERFACESSTABILITYSUBSTRATEMD Multidisciplinary
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