Performance of Co/Al2O3/NiFe magnetic tunnel junctions prepared by a two-step rf plasma oxidation method

Yoon, KS; Park, JH; Choi, Jinho; Yang, JY; Lee, CH; Kim, CO; Hong, JP; Kang, TW

Performance of Co/Al2O3/NiFe magnetic tunnel junctions prepared by a two-step rf plasma oxidation method

Version 2 2024-06-05, 01:14

Version 1 2019-07-19, 14:22

journal contribution

posted on 2024-06-05, 01:14 authored by KS Yoon, JH Park, Jinho Choi, JY Yang, CH Lee, CO Kim, JP Hong, TW Kang

Performance of Co/Al2O3/NiFe magnetic tunnel junctions prepared by a two-step rf plasma oxidation method

History

Journal

Applied Physics Letters

Volume

79

Pagination

1160-1162

Publisher DOI

https://doi.org/10.1063/1.1391407

ISSN

0003-6951

eISSN

1077-3118

Language

English

Author URL

http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcApp=PARTNER_APP&SrcAuth=LinksAMR&KeyUT=WOS:000170429000030&DestLinkType=FullRecord&DestApp=ALL_WOS&UsrCustomerID=a045e4b2bb1f2b747c68c720ec8913b7

Publication classification

CN.1 Other journal article

Issue

8

Publisher

AMER INST PHYSICS

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Keywords

Science & Technology Physical Sciences Physics, Applied Physics MAGNETORESISTANCE Technology

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Performance of Co/Al2O3/NiFe magnetic tunnel junctions prepared by a two-step rf plasma oxidation method

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