Physical vs photolithographic patterning of plasma polymers: An investigation by ToF-SSIMS and multivariate analysis

journal contribution

posted on 2024-08-20, 06:28 authored by G Mishra, CD Easton, Sally McArthurSally McArthur

Physical vs photolithographic patterning of plasma polymers: An investigation by ToF-SSIMS and multivariate analysis

History

Journal

Langmuir

Volume

26

Pagination

3720-3730

Location

United States

Publisher DOI

https://doi.org/10.1021/la902930z

ISSN

0743-7463

eISSN

1520-5827

Language

English

Author URL

https://www.ncbi.nlm.nih.gov/pubmed/19950941

Publication classification

C1.1 Refereed article in a scholarly journal

Issue

5

Publisher

AMER CHEMICAL SOC

Publication URL

http://dx.doi.org/10.1021/la902930z

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Categories

Keywords

Science & Technology Physical Sciences Technology Chemistry, Multidisciplinary Chemistry, Physical Materials Science, Multidisciplinary Chemistry Materials Science SELF-ASSEMBLED MONOLAYERS ACRYLIC-ACID MICROPATTERNED SURFACES PROTEIN ADSORPTION POLYMERIZATION NANOLITHOGRAPHY IMMOBILIZATION LITHOGRAPHY TETRAGLYME DEPOSITION

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All Rights Reserved

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