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Synthesis and growth mechanism of Thin-film TiO2 nanotube arrays on focused-ion-beam micropatterned 3D isolated regions of titanium on silicon

journal contribution
posted on 2013-01-01, 00:00 authored by H Hamedani, S Lee, A Al-Sammarraie, Z Hesabi, Asim BhattiAsim Bhatti, F Alamgir, H Garmestani, M Khaleel
In this paper, the fabrication and growth mechanism of net-shaped micropatterned self-organized thin-film TiO2 nanotube (TFTN) arrays on a silicon substrate are reported. Electrochemical anodization is used to grow the nanotubes from thin-film titanium sputtered on a silicon substrate with an average diameter of ?30 nm and a length of ?1.5 ?m using aqueous and organic-based types of electrolytes. The fabrication and growth mechanism of TFTN arrays from micropatterned three-dimensional isolated islands of sputtered titanium on a silicon substrate is demonstrated for the first time using focused-ion-beam (FIB) technique. This work demonstrates the use of the FIB technique as a simple, high-resolution, and maskless method for high-aspect-ratio etching for the creation of isolated islands and shows great promise toward the use of the proposed approach for the development of metal oxide nanostructured devices and their integration with micro- and nanosystems within silicon-based integrated-circuit devices.

History

Journal

ACS applied materials and interfaces

Volume

5

Issue

18

Pagination

9026 - 9033

Publisher

American Chemical Society

Location

Washington, D.C.

ISSN

1944-8244

eISSN

1944-8252

Language

eng

Publication classification

C1 Refereed article in a scholarly journal

Copyright notice

2013, American Chemical Society