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Synthesis and growth mechanism of Thin-film TiO2 nanotube arrays on focused-ion-beam micropatterned 3D isolated regions of titanium on silicon
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posted on 2013-01-01, 00:00 authored by H Hamedani, S Lee, A Al-Sammarraie, Z Hesabi, Asim BhattiAsim Bhatti, F Alamgir, H Garmestani, M KhaleelIn this paper, the fabrication and growth mechanism of net-shaped micropatterned self-organized thin-film TiO2 nanotube (TFTN) arrays on a silicon substrate are reported. Electrochemical anodization is used to grow the nanotubes from thin-film titanium sputtered on a silicon substrate with an average diameter of ?30 nm and a length of ?1.5 ?m using aqueous and organic-based types of electrolytes. The fabrication and growth mechanism of TFTN arrays from micropatterned three-dimensional isolated islands of sputtered titanium on a silicon substrate is demonstrated for the first time using focused-ion-beam (FIB) technique. This work demonstrates the use of the FIB technique as a simple, high-resolution, and maskless method for high-aspect-ratio etching for the creation of isolated islands and shows great promise toward the use of the proposed approach for the development of metal oxide nanostructured devices and their integration with micro- and nanosystems within silicon-based integrated-circuit devices.
History
Journal
ACS applied materials and interfacesVolume
5Issue
18Pagination
9026 - 9033Publisher
American Chemical SocietyLocation
Washington, D.C.Publisher DOI
ISSN
1944-8244eISSN
1944-8252Language
engPublication classification
C1 Refereed article in a scholarly journalCopyright notice
2013, American Chemical SocietyUsage metrics
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