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The evolution of preferred orientation and morphology of AlN films under various sputtering parameters

journal contribution
posted on 2023-11-03, 05:03 authored by Z Wei, L Shen, Y Kuang, J Wang, G Yang, Weiwei LeiWeiwei Lei
The evolution of preferred orientation and morphology of AlN films under various sputtering parameters

History

Journal

Journal of Crystal Growth

Volume

625

Article number

127439

Pagination

1-7

Location

Amsterdam, The Netherlands

Publisher DOI

ISSN

0022-0248

Language

eng

Publication classification

C1 Refereed article in a scholarly journal

Publisher

Elsevier

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    All Rights Reserved

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